顶旭桌面微型光刻机,专为微米级图案制作而设计,旨在保障卓越的图形转移精度。
设备采用紫外LED冷光源,结合双非球面石英透镜,可生成半角<2°的平行光,相较传统接触式曝光机,其极致紧凑的体积将移形换影置于桌面之上,为操作提供了便利与精准。
该光刻机广泛适用于微流控芯片、MEMS器件、光电子器件以及声表面波器件等制备领域。其性能尤其适合高校、科研院所以及企业展开微细加工工艺研究。
紧随现代技术的步伐,顶旭桌面微型光刻机的问世为微纳加工注入了新的活力,助力客户在项目目标的实现过程中迈向更高精度、更具创新性的阶段。
This equipment is easy to operate and user-friendly. The specific operations are as follows:
I. Preparations Before Exposure
1)Silicon Wafer Preparation: Ensure that the silicon wafer to be exposed has undergone photoresist coating, with a clean and smooth surface, free from obvious stains or damage.
2)Selecting the Photomask: Depending on the project requirements, choose a photomask of the appropriate size. This equipment is compatible with 4-inch, 5-inch, or 6-inch photomasks.
3)Equipment Inspection: Carefully inspect the equipment to ensure all components are in normal working condition, and confirm that the operating environment is suitable.
II. Exposure Operation Steps
1)Install the Silicon Wafer: Place the silicon wafer to be exposed flat on the equipment chuck, ensuring accurate positioning.
2)Position the Photomask: Place the photomask flat above the silicon wafer. If using film masks, transparent glass should be positioned above to maintain stability.
3)Set Exposure Parameters: Use the control panel to set the exposure time and intensity, adjusting them based on specific requirements.
(Save Exposure Parameters: The parameter function allows the convenient saving of commonly used exposure parameters for easy retrieval during usage.)
4) Start Exposure: After confirming the parameter settings are correct, click the start button, and the equipment will initiate the exposure process.
5) Monitor Exposure Progress: During the exposure process, you can monitor the progress through the equipment interface to ensure everything is proceeding smoothly.
6) Exposure Completion: Once the exposure is complete, the equipment will provide a prompt. Remove the silicon wafer and the photomask.
DingXu (Suzhou) Microfluidics Technology Co., Ltd. is a high-tech enterprise dedicated to the field of microfluidics. We are committed to providing customers with comprehensive microfluidic solutions, including customized microfluidic chip development, surface modification, microfluidic chip processing equipment, and microfluidic instruments. Our team boasts extensive experience and technical expertise, continuously combining professional knowledge with innovative thinking to deliver high-quality solutions. We consistently prioritize customer-centric values, embrace self-challenges, and pursue excellence. Through professionalism, innovation, and collaboration, we aim to create greater value for our customers and contribute to a brighter future in the field of microfluidics.
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