SU-8 photoresist is a high-resolution, high-precision, high-adhesion negative photoresist, which is widely used in the field of micro and nanofabrication. In microfluidic chips, SU-8 photoresist is widely used in the preparation of microfluidic chips, which can be used to prepare microstructures such as microfluidic channels, reaction chambers, valves and pumps.
Specifically, the application of SU-8 photoresist in microfluidic chips can be categorized into two aspects: the preparation of microstructures and the packaging of microfluidic chips.
1. Preparation of microstructures
SU-8光刻胶可以用来制备SU8模具,浇筑PDMS chip。SU-8 光刻胶可以通过光刻工艺制备出微流道、反应室、泵、阀门等微型结构。
相比其他材料,SU-8 光刻胶的附着性更强,精度更高,因此可以制备更复杂、更精细的微型结构。此外,SU-8 光刻胶还具有较高的耐化学性和耐高温性,使得其可以承受更严苛的微流控条件。
2. Packaging of microfluidic chips
在微流控芯片的制备过程中,需要对微型结构进行封装,以保证微流控芯片的稳定性和可靠性。
SU-8 光刻胶可以作为微流控芯片的封装材料之一,可以用于制备微流控芯片的上下盖板,也可以用于制备微流控芯片的连接件、密封件等。
In conclusion, the application of SU-8 photoresist in microfluidic chips is of great significance, which can realize the high-precision preparation and encapsulation of microfluidic chips, and provide a strong support for the research and application of microfluidic chips.
Common models of SU-8 photoresist are listed below:
SU-8 2000series | Single spin coating film thickness range |
SU-8 2002 | 1~4um |
SU-8 2005 | 3~8um |
SU-8 2010 | 7~15um |
SU-8 2025 | 15~40 |
SU-8 2050 | 20~100um |
SU-8 2075 | 50~200um |
SU-8 2100 | 80~250um |
SU-8 2150 | 130~400um |
A developer is a chemical solution used in the photolithography process, primarily to remove portions of unexposed areas from the photoresist pattern to create the desired microstructure. The composition and formulation of a developer solution will vary depending on the type and use of the photoresist, and will generally contain the following key ingredients:
1. Alkaline solution: The developer solution usually contains an alkaline substance, such as sodium hydroxide, sodium bicarbonate, etc., which is used to remove unexposed photoresist areas. The concentration and type of alkaline solution needs to be adjusted to the specific photoresist type and thickness.
2. Promoter: Promoter can accelerate the development process, improve the efficiency and speed of development, usually used promoter ammonia, ethylenediamine and so on.
3. Inhibitors: Inhibitors are used to inhibit the etching rate of the developer in the exposed area of the photoresist, thus preventing excessive removal of the photoresist. The type and concentration of the inhibitor also needs to be adjusted according to the type and thickness of the photoresist.
4. Deionized water: Deionized water is a solvent in the developer, used to dilute the developer and rinse the chip after development, thus reducing the corrosion and pollution of the chip material.
In conclusion, the developer is an indispensable part of the photolithography process, and its composition and formulation need to be selected and adjusted according to the specific experimental needs and photoresist type to ensure the accuracy and stability of the photolithography effect and experimental results.
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